This achievement is a critical and necessary step in generating a zero-defect mask blank.

Cleaning of defects is a critical and necessary step in generating a zero-defect mask blank, because defects in the substrate become defects in the multilayer, which ruins the mask blank.

This achievement is a critical and necessary step in generating a zero-defect mask blank. It demonstrates that the MBDC now has world-class cleaning capability in addition to our world-class deposition expertise.

first step in a defect investigation.

A great deal of work still remains for getting EUV mask blanks ready for manufacturing, but our cleaning methodology has removed another barrier. We are well positioned for the tasks ahead.

I think it's a logical step, and I think it's necessary.